Curator's Take
This article highlights a significant infrastructure investment that addresses one of quantum computing's most fundamental challenges: fabricating superconducting qubits with atomic-scale precision. The Oxford Instruments PlasmaPro ASP system represents cutting-edge atomic layer deposition technology that can deposit materials one atomic layer at a time, which is crucial for creating the ultra-clean interfaces and precise geometries needed for high-coherence superconducting qubits. NYU becoming the first U.S. facility to deploy this technology for quantum applications signals the growing recognition that quantum computing success hinges not just on clever algorithms, but on having world-class fabrication capabilities that can manufacture qubits with the exacting standards these delicate quantum systems demand. This partnership between Oxford Instruments and NYU's nanofabrication facility could accelerate the development of more reliable superconducting quantum processors across the broader U.S. quantum research ecosystem.
— Mark Eatherly
Summary
Insider Brief PRESS RELEASE — New York University’s NYU Nanofabrication Cleanroom has enhanced its quantum fabrication capabilities by installing an Oxford Instruments PlasmaPro ASP atomic layer deposition (ALD) system, becoming the first in the United States to utilise this technology for superconducting quantum applications. This acquisition, funded by the U.S. Microelectronics Commons through the NORDTECH hub, […]